Quantum Electronics and Laser Technology
Poster Session II
Saturday,
Dec. 4, 2021 09:30-11:30
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| Presider: |
n.a. |
| Room: |
Corridor |
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Manuscript ID. 0489
Paper No. 2021-SAT-P0302-P004
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| CHUN-TSE WU
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Simulation Framework of Laser Produced Tin Plasma Extreme Ultraviolet Light Emission
CHUN-TSE WU;Yao-Li Liu;Po-Yen Lai;Shih-Hung Chen
Enhancement of the conversion efficiency (CE) of Laser-produced plasma extreme ultraviolet (LPP-EUV) light emission at 13.5 nm is a crucial issue for large volume semiconductor manufacturing. The revised one-dimensional plasma simulation code MEDUSA is integrated with the atomic model, collisional radiative equilibrium model and the radiation transport model to investigate this multi-time scale processes of LPP-EUV light emission. The simulation framework has been validated by comparisons with some experimental results and has become an essential tool for optimizing the CE of LPP-EUV light emission.
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